Influence of thickness and morphology of MoS₂ on the performance of counter electrodes in dye-sensitized solar cells

• Lam Thuy Thi Mai,
• Hai Viet Le,
• Ngan Kim Thi Nguyen,
• Van La Tran Pham,
• Thu Anh Thi Nguyen,
• Nguyen Thanh Le Huynh and
• Hoang Thai Nguyen

Beilstein J. Nanotechnol. 2022, 13, 528–537, doi:10.3762/bjnano.13.44

• grids with a diameter of around 50 nm (see Figure 3e, insert). The roughness of the films was further studied by AFM. The film with the honeycomb-like structure showed the highest average roughness (Sa) and root mean square roughness (Sq) of 24.179 and 30.443 nm, respectively (see Supporting Information

Evaluation of click chemistry microarrays for immunosensing of alpha-fetoprotein (AFP)

• Seyed Mohammad Mahdi Dadfar,
• Sylwia Sekula-Neuner,
• Vanessa Trouillet,
• Hui-Yu Liu,
• Ravi Kumar,
• Annie K. Powell and
• Michael Hirtz

Beilstein J. Nanotechnol. 2019, 10, 2505–2515, doi:10.3762/bjnano.10.241

• File 1, Figure S1. While the roughness increases slightly over the course of functionalization, overall, the samples remain relatively smooth with root-mean-square roughness values (Rq) below 1 nm, showing a homogeneous reaction built-up without introduction of a nanotexture that might lead to

Atomic force acoustic microscopy reveals the influence of substrate stiffness and topography on cell behavior

• Yan Liu,
• Li Li,
• Xing Chen,
• Ying Wang,
• Meng-Nan Liu,
• Jin Yan,
• Liang Cao,
• Lu Wang and
• Zuo-Bin Wang

Beilstein J. Nanotechnol. 2019, 10, 2329–2337, doi:10.3762/bjnano.10.223

• ∙m-1. For each film, about 20 force curves were obtained around the stripe and the unexposed region of the patterns. The root-mean-square roughness of the SU-8 films was determined from the surface morphological images of AFAM. The scan was performed on a field of view of 10 μm × 10 μm at the

In situ AFM visualization of Li–O₂ battery discharge products during redox cycling in an atmospherically controlled sample cell

• Kumar Virwani,
• Younes Ansari,
• Khanh Nguyen,
• Francisco José Alía Moreno-Ortiz,
• Jangwoo Kim,
• Maxwell J. Giammona,
• Ho-Cheol Kim and
• Young-Hye La

Beilstein J. Nanotechnol. 2019, 10, 930–940, doi:10.3762/bjnano.10.94

• 1 ppm [42]. Glassy carbon was laser cut into 12 mm diameter discs. The surface of the glassy carbon was polished [43] to an average root-mean-square roughness of less than 10 nm. Upon polishing, the glassy carbon was cleaned with isopropyl alcohol and deionized water and further dried in a vacuum

Contact splitting in dry adhesion and friction: reducing the influence of roughness

• Jae-Kang Kim and
• Michael Varenberg

Beilstein J. Nanotechnol. 2019, 10, 1–8, doi:10.3762/bjnano.10.1

• their attachment abilities are reduced if the fibril dimensions are similar to the root-mean-square roughness, the mean spacing between local peaks, and the surface waviness characteristics of the substrate [20][21][22][23]. Analogous negative effects of roughness on adhesion and friction of biomimetic

• Spearman’s rank correlation coefficient (−0.97 vs −0.95) than the root-mean-square roughness Rq. This correlation supports our analysis of the relationships between adhesion, roughness and waviness, and proves that the adhesive performance of the wall-shaped microstructure depends on the microscale roughness

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

• Sherif Okeil and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

• silver films were characterized using atomic force microscopy (AFM) in contact mode on a CP-II AFM (Bruker-Veeco) with SiC cantilevers to determine the topography and surface roughness (root mean square roughness, Rq). Scanning electron microscopy (SEM) of the silver films was performed on a Philips XL

Toward the use of CVD-grown MoS₂ nanosheets as field-emission source

• Geetanjali Deokar,
• Nitul S. Rajput,
• Junjie Li,
• Francis Leonard Deepak,
• Wei Ou-Yang,
• Nicolas Reckinger,
• Carla Bittencourt,
• Jean-Francois Colomer and
• Mustapha Jouiad

Beilstein J. Nanotechnol. 2018, 9, 1686–1694, doi:10.3762/bjnano.9.160

• crystals. Therefore, unlike in the previous case [20], the growth of micrometer-size crystals (of Mo or MoO3) on the sample surface was not observed. The AFM measurements confirm (Figure S1, Supporting Information File 1) a dense growth of MoS2 NSs. The observed root mean square roughness was 8 nm

Blister formation during graphite surface oxidation by Hummers’ method

• Olga V. Sinitsyna,
• Georgy B. Meshkov,
• Anastasija V. Grigorieva,
• Alexander A. Antonov,
• Inna G. Grigorieva and
• Igor V. Yaminsky

Beilstein J. Nanotechnol. 2018, 9, 407–414, doi:10.3762/bjnano.9.40

• unevenly arranged over the surface and have a wide size distribution. We found blisters with a diameter from 14 nm to 1430 nm and a height from 0.5 nm to 187 nm. The root mean square roughness measured in images with an area of 100 μm2 increased from 1–2 nm to ≈100 nm. The formation of blisters occurs if

Vapor-phase-synthesized fluoroacrylate polymer thin films: thermal stability and structural properties

• Paul Christian and
• Anna Maria Coclite

Beilstein J. Nanotechnol. 2017, 8, 933–942, doi:10.3762/bjnano.8.95

• force microscopy (AFM) for the as-prepared and heat-treated samples (see Figure 3). For pristine p-PFDA films, the surface consists of randomly distributed spherical aggregations, forming a hillock-like structure. This is also reflected by the root mean square roughness (σ) of the surface, which was

• the otherwise smooth polymer film. Except for these grains, the layer’s root mean square roughness is below 2 nm, indicating a rather smooth coating of the silicon wafer (roughness below 1 nm). This morphology persists as the EGDMA content increases, suggesting that the transition from spherical

Vapor deposition routes to conformal polymer thin films

• Priya Moni,
• Ahmed Al-Obeidi and
• Karen K. Gleason

Beilstein J. Nanotechnol. 2017, 8, 723–735, doi:10.3762/bjnano.8.76

• very thin films, conformal protection requires that the deposited film has a smooth, pin-hole free morphology, with the root mean square roughness much smaller than film thickness. Applications To date, a variety of conformal polymer thin films have on many substrates from nanometer length to sub

Surface roughness rather than surface chemistry essentially affects insect adhesion

• Matt W. England,
• Tomoya Sato,
• Makoto Yagihashi,
• Atsushi Hozumi,
• Stanislav N. Gorb and
• Elena V. Gorb

Beilstein J. Nanotechnol. 2016, 7, 1471–1479, doi:10.3762/bjnano.7.139

• (AFM, XE-100, Park Systems), with a Si probe (910M-NCHR; spring constant of 42 N/m and response frequency of 330 kHz, Park Systems). The surface roughness (root-mean square roughness, Rrms) were estimated using two separate techniques due to the huge disparity in the size of surface textures on smooth

An ellipsometric approach towards the description of inhomogeneous polymer-based Langmuir layers

• Falko O. Rottke,
• Burkhard Schulz,
• Klaus Richau,
• Karl Kratz and
• Andreas Lendlein

Beilstein J. Nanotechnol. 2016, 7, 1156–1165, doi:10.3762/bjnano.7.107

• ). All ellipsometric maps were converted into thickness maps by introduction of the refractive index that was derived from independent ellipsometric experiments, and the result was additionally evaluated in terms of the root mean square roughness, Rq. Thereby, a three-dimensional view into the layers was

• enabled and morphological inhomogeneity could be quantified. Keywords: ellipsometric mapping; Langmuir monolayer; polyester; root mean square roughness; spectroscopic ellipsometry; Introduction Ellipsometry is an established in situ technique to investigate surfaces, capable to derive information about

• dimension at the nm scale. Additionally, the root mean square roughness, Rq, of an observed surface can be evaluated. This, in combination with the dispersion of Δ and Ψ over a region of interest (ROI), allows easy differentiation between various parts of an inhomogeneous layer [11]. In any case, both

Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

• Federico Baiutti,
• Georg Christiani and
• Gennady Logvenov

Beilstein J. Nanotechnol. 2014, 5, 596–602, doi:10.3762/bjnano.5.70

• . Thus, we suppose that the LSAO substrate has a mixed termination of LaSrO and AlO2 layers. The root mean square roughness is in both cases Rms = 0.4 nm over a scanning area of 25 μm2. In the former image, one can see clear atomic terraces, about 300 nm wide, with 0.5 unit cell tall steps due to the

DNA origami deposition on native and passivated molybdenum disulfide substrates

• Xiaoning Zhang,
• Masudur Rahman,
• David Neff and
• Michael L. Norton

Beilstein J. Nanotechnol. 2014, 5, 501–506, doi:10.3762/bjnano.5.58

• (Figure 2a). For optimal AFM imaging, the roughness of the surface should be kept as low as possible in order to avoid additional noise in the imaging of these very thin (about 2 nm) objects. Based on measurements taken over a 5 μm × 5 μm area similar to that shown in Figure 2a, the root mean square

• roughness (RMS) of the MoS2 surface was found to be 0.92 Å, indicating that MoS2 presents an ideal physical surface for the deposition of flat DNA nanostructures. Importantly, AFM imaging reveals that shape and structure of the DNA origami constructs tended to be lost (Figure 2b) when the DNA origami was

Octadecyltrichlorosilane (OTS)-coated ionic liquid drops: Micro-reactors for homogenous catalytic reactions at designated interfaces

• Xiaoning Zhang and
• Yuguang Cai

Beilstein J. Nanotechnol. 2012, 3, 33–39, doi:10.3762/bjnano.3.4

• Eclipse 55c microscope. Procedures The silicon wafers (Nitrogen doped, resistivity 1–40 Ω∙cm) were polished to an ultra-flat level (root mean square roughness <5 Å) and were then cut into 1 × 1 cm2 pieces. The wafer samples were cleaned by piranha solution (1 part of 98% H2SO4 and 2 parts of 30% hydrogen